Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
采用磁控濺射法制備錳銅薄膜,濺射和真空蒸發(fā)法制備鐿薄膜.
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Suitable for making heating element for electrical oven and magnetron.
適用于制作電氣爐發(fā)熱元件等.
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The kinetic process of reactive magnetron sputtering has been studied.
研究了反應磁控濺射的動力學過程.
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Magnetron is often used as microwave power source in clinical linac magnetron.
在醫(yī)用直線加速器中通常都采用磁控管作為微波功率源.
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Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .
采用射頻 磁控濺射 技術(shù)制備出硼碳氮 ( BCN ) 薄膜.
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The generator represents magnetron, packaged with constant magnets in ceramic - metal execution.
該磁控管采用金屬陶瓷封裝,裝有永磁體.
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The generator represents magnetron , packaged with constants and electromagnets ( 2 coils magnetic ) in the magnetic - shielded ceramic - metal execution.
該磁控管的設(shè)計采用電磁石,封裝采用金屬陶瓷.
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Si rich SiO 2 films have been prepared by a rf magnetron sputter method.
用射頻磁控濺射法制備了富硅二氧化硅薄膜.
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Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低頻反應磁控濺射制備五氧化二鈮光學薄膜.
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Methods: The nature HA films were prepared by electron beam evaporation and rf - magnetron sputtering techniques.
方法: 用電子束蒸發(fā)和射頻磁控濺射兩種技術(shù)制備了天然HA薄膜.
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The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.
利用微波ECR等離子體增強磁控濺射沉積技術(shù)在玻璃表面制備了硅膜.
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Its principle and some other aredescribed, including the magnetron sputter coater and the osmium plasma coater.
本文將主要敘述等離子濺射鍍膜的原理與方法,并且簡單介紹磁控管濺射儀和鋨等離子鍍膜儀等.
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Ti - O film was prepared by microwave - electron convolute resonance ( MW - ECR ) magnetron filter arc deposition process.
采用微波電子回旋 共振 磁過濾弧設(shè)備制備鈦氧薄膜.
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In the fourth chapter Sb - doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.
第五章研究了直流磁控濺射制備Sb摻雜 TiO2的成膜特點.
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Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.
采用磁控射頻反應濺射法在單晶硅片上制備了二氧化硅薄膜.
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